Kaiting Li

Title: The Innovative Contributions of Kaiting Li

Introduction

Kaiting Li is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of chemical mechanical polishing through his innovative patent. His work is characterized by a focus on enhancing the efficiency and effectiveness of polishing pads used in various applications.

Latest Patents

Kaiting Li holds a patent for a "Textured CMP pad comprising polymer particles." This invention features a chemical mechanical polishing pad that includes a polymeric body with a plurality of polymer particles embedded within it. Notably, at least a portion of these polymer particles is partially exposed at the surface of the polymeric body, which is designed to improve the polishing process. The pad also incorporates a plurality of pores at the surface, further enhancing its functionality. This patent showcases his expertise and innovative approach in the field, with a total of 1 patent to his name.

Career Highlights

Kaiting Li is currently employed at CMC Materials, Inc., where he continues to develop and refine technologies related to chemical mechanical polishing. His role at the company allows him to apply his inventive skills in a practical setting, contributing to advancements in the industry.

Collaborations

Throughout his career, Kaiting has collaborated with talented individuals such as Rui Ma and Jessica Tabert. These collaborations have likely fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kaiting Li's contributions to the field of chemical mechanical polishing are noteworthy. His innovative patent and work at CMC Materials, Inc. highlight his commitment to advancing technology in this area. His collaborations with colleagues further enhance his impact on the industry.