Kaicheng Chou

Title: Kaicheng Chou: Innovator in Plasma Etching Technology

Introduction

Kaicheng Chou, an accomplished inventor based in San Jose, California, has made significant contributions to the field of semiconductor fabrication. With a focus on enhancing plasma etching processes, Chou holds a patent that exemplifies his innovative approach in this highly technical domain.

Latest Patents

Chou's notable patent, titled "Method and resulting structure for PCMO film to obtain etching rate and mask to selectively by inductively coupled plasma," presents a cutting-edge method that utilizes inductively coupled plasma (ICP) for increased selectivity and etch rates. This invention employs a sophisticated plasma chemistry approach, which is segmented into two main stages: the main etch step that combines gases such as Cl, HBr, and CF for rapid etching, and the over etch step involving HBr and Ar to reduce the etch rate while ensuring thorough removal of residues without damaging the underlying layers.

Career Highlights

Chou is associated with Winbond Electronics Corporation, a company renowned for its work in memory and semiconductor technologies. His unique patent emphasizes both speed and precision within the etching process, showcasing his expertise and commitment to advancing semiconductor manufacturing techniques.

Collaborations

In his professional journey, Chou has collaborated with colleagues such as Kenlin Huang and Harry Luan. Their collective efforts highlight the importance of teamwork in driving innovation and achieving breakthroughs in technology.

Conclusion

Kaicheng Chou stands out as a visionary inventor whose contributions to plasma etching are paving the way for advancements in semiconductor fabrication. His patent not only reflects his technical ingenuity but also underscores the importance of innovative thinking in the ever-evolving landscape of technology.