This inventor holds 2 USPTO granted patents and 6 published patent applications. Top assignee: Rohm and Haas Electronic Materials Korea Ltd.. Active years: 2021-2022.
Location History:
- Hwaseong, KR (2021)
- Gyeonggi-do, KR (2022)
Company Filing History:
Years Active: 2021-2022
Title: Kahee Shin: Innovator in Photosensitive Resin Technology
Introduction
Kahee Shin is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of photosensitive resin compositions, holding 2 patents that showcase his innovative approach to material science.
Latest Patents
His latest patents include a positive-type photosensitive resin composition and a cured film prepared therefrom. This invention relates to a composition that comprises a photopolymerizable compound containing a double bond and a specific photopolymerization initiator. The unique feature of this composition is that it suppresses the photopolymerization reaction upon exposure to light but activates it during photobleaching after development. This control over flowability during thermal curing allows for the formation of patterns while maintaining excellent sensitivity during the development and hard-bake processes. Additionally, he has developed a photosensitive resin composition that excels in adhesiveness and sensitivity. This composition provides a cured film that is transparent, chemically resistant, and adheres well when immersed in a stripper, making it suitable for applications in liquid crystal displays and organic EL displays.
Career Highlights
Kahee Shin is currently employed at Rohm and Haas Electronic Materials Korea Ltd., where he continues to advance his research and development efforts in the field of electronic materials. His work has significantly impacted the industry, particularly in enhancing the performance of photosensitive materials.
Collaborations
Kahee Shin collaborates with Geun Huh, a fellow innovator in the field. Their partnership has fostered advancements in the development of new materials and technologies.
Conclusion
Kahee Shin's contributions to the field of photosensitive resin technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material properties and their applications in modern technology.