Company Filing History:
Years Active: 2025
Title: Kae Takahashi: Innovator in Plasma Processing Technology
Introduction
Kae Takahashi is a notable inventor based in Miyagi, Japan. She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a unique plasma processing method that enhances the efficiency of etching processes in semiconductor manufacturing.
Latest Patents
Kae Takahashi holds a patent for a plasma processing method and system. This method involves providing a substrate with an etching target film, which includes a silicon oxide film and a silicon nitride film. The process generates two distinct plasmas from specific processing gases to etch the silicon nitride and silicon oxide films. Notably, the substrate support temperature is maintained at 0° C. or lower during the etching process. This innovative approach is crucial for improving the precision and effectiveness of semiconductor fabrication.
Career Highlights
Kae Takahashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her work at this esteemed organization has allowed her to apply her expertise in plasma processing technology. She has been instrumental in advancing the company's capabilities in this area.
Collaborations
Kae collaborates with talented colleagues, including Maju Tomura and Yoshihide Kihara. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Kae Takahashi's contributions to plasma processing technology exemplify her dedication to innovation in the semiconductor industry. Her patent and work at Tokyo Electron Limited highlight her role as a leading inventor in this field.