K C Chang

Title: K C Chang: Innovator in High Electron Mobility Transistors

Introduction

K C Chang is a prominent inventor based in Taipei, Taiwan. He is known for his significant contributions to the field of semiconductor technology, particularly in the development of high electron mobility transistors (HEMTs). His innovative work has led to advancements that are crucial for various electronic applications.

Latest Patents

K C Chang holds a patent for a high electron mobility transistor and its manufacturing method. The patent describes a HEMT device that includes a substrate, a first gallium nitride (GaN) layer, a P-type GaN layer, a second GaN layer, a barrier layer, a gate, a source, and a drain. The first GaN layer is formed on the substrate and features a stepped contour from a cross-section view. The P-type GaN layer is positioned on an upper step surface of the stepped contour, exhibiting a vertical sidewall. The second GaN layer is placed atop the P-type GaN layer, while the barrier layer is formed on the second GaN layer. Two-dimensional electron gas regions are created at the junctions between the barrier layer and the first and second GaN layers. The gate is situated on the outer side of the vertical sidewall. This innovative design enhances the performance of electronic devices.

Career Highlights

K C Chang is currently employed at Richtek Technology Corporation, a leading company in the semiconductor industry. His work at Richtek has allowed him to focus on cutting-edge technologies and contribute to the advancement of electronic components. His expertise in HEMTs has positioned him as a valuable asset in the field.

Collaborations

K C Chang has collaborated with notable colleagues, including Chih-Fang Huang and Po-Chin Peng. These collaborations have fostered an environment of innovation and have led to significant advancements in semiconductor technology.

Conclusion

K C Chang's contributions to the field of high electron mobility transistors exemplify his dedication to innovation and technology. His work continues to influence the semiconductor industry, paving the way for future advancements.