Jyun-Yan Jiang

Title: Innovations of Jyun-Yan Jiang

Introduction

Jyun-Yan Jiang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

Jyun-Yan Jiang's latest patents include a "Substrate container with enhanced flow field therein" and a "Composite material and a semiconductor container made of the same." The substrate container patent describes a design that incorporates an offset inflation mechanism and a gas diffusion mechanism to improve the flow of gases within the container. The composite material patent focuses on a semiconductor container made from a graphene material doped cycloolefin copolymer, among other materials, highlighting the advanced materials used in modern semiconductor applications.

Career Highlights

Jyun-Yan Jiang is currently employed at Gudeng Precision Industrial Co., Ltd., where he applies his expertise in developing innovative solutions for the semiconductor industry. His work has contributed to advancements in the efficiency and functionality of semiconductor containers.

Collaborations

Some of his coworkers include Ming-Chien Chiu and En-Nien Shen, who collaborate with him on various projects within the company.

Conclusion

Jyun-Yan Jiang's contributions to semiconductor technology through his patents and work at Gudeng Precision Industrial Co., Ltd. demonstrate his commitment to innovation and excellence in the field. His inventions are paving the way for future advancements in semiconductor applications.