The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2024
Filed:
Mar. 10, 2021
Gudeng Precision Industrial Co., Ltd., New Taipei, TW;
Ming-Chien Chiu, New Taipei, TW;
En-Nien Shen, New Taipei, TW;
Yung-Chin Pan, New Taipei, TW;
Chih-Ming Lin, New Taipei, TW;
Wei-Chien Liu, New Taipei, TW;
Cheng-En Chung, New Taipei, TW;
Po-Ting Lee, New Taipei, TW;
Jyun-Yan Jiang, New Taipei, TW;
GUDENG PRECISION INDUSTRIAL CO., LTD., New Taipei, TW;
Abstract
A substrate container with enhanced flow field therein includes a box, at least one offset inflation mechanism and at least one gas diffusion mechanism. The offset inflation mechanism is disposed outside internal receiving space of the box. The offset inflation mechanism has a gaseous chamber extending in the same direction as a bottom panel. The gas diffusion mechanism includes a base, a partition wall and at least one diffusion member. The base masks an outlet of the gaseous chamber to form an auxiliary gaseous chamber. The partition wall extends perpendicularly to the bottom panel to form a vertical first gas channel in communication with the auxiliary gaseous chamber. The diffusion member and the partition wall together define a second gas channel. The partition wall has at least one gap whereby the first gas channel and the second gas channel are in communication with each other.