Kaohsiung, Taiwan

Jyun-Jhih Yang

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Advanced Semiconductor Engineering, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jyun-Jhih Yang. Retrieved from https://idiyas.com/inventor/jyun-jhih-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Jyun-Jhih Yang: Innovator in Electronic Devices

Introduction

Jyun-Jhih Yang is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of electronic devices, showcasing his innovative spirit through his patented inventions. His work focuses on enhancing the functionality and reliability of electronic components.

Latest Patents

Jyun-Jhih Yang holds a patent for an electronic device that includes a substrate, an electronic component, a circuit structure, and a shielding layer. This invention is designed to protect the electronic component from electromagnetic interference, ensuring optimal performance. The shielding layer is strategically placed to cover the electronic component while being connected to the circuit structure, demonstrating a thoughtful approach to electronic design. He has 1 patent to his name.

Career Highlights

Yang is currently employed at Advanced Semiconductor Engineering, Inc., where he continues to develop innovative solutions in the semiconductor industry. His role allows him to collaborate with other talented professionals and contribute to cutting-edge technology.

Collaborations

Some of his coworkers include Meng-Jen Wang and Chien-Yuan Tseng, who work alongside him in advancing the company's technological capabilities.

Conclusion

Jyun-Jhih Yang's contributions to electronic devices highlight his innovative mindset and dedication to improving technology. His patent reflects a commitment to excellence in the field, making him a valuable asset to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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