Bengaluru, India

Jyoti Prakash Deo


Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Jyoti Prakash Deo: Innovator in Vacuum Chucking Technology

Introduction

Jyoti Prakash Deo is a notable inventor based in Bengaluru, India. She has made significant contributions to the field of vacuum chucking technology, particularly in the semiconductor industry. Her innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate handling.

Latest Patents

Jyoti Prakash Deo holds a patent for "Susceptor wafer chucks for bowed wafers - Apparatus and methods for vacuum chucking a substrate to a susceptor." This invention features a susceptor that comprises one or more angularly spaced pockets positioned around a center axis. The design includes both inner and outer pockets, allowing for versatile configurations. The susceptor can function as an intermediate chuck or a distributed chuck, depending on the positioning of the pucks. Each puck is equipped with a center hole, at least one radial channel, and at least one circular channel with chuck holes for effective vacuum chucking of substrates. She has 1 patent to her name.

Career Highlights

Jyoti Prakash Deo is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her work focuses on advancing technologies that improve manufacturing processes and product quality. Her innovative spirit and technical expertise have made her a valuable asset to her team.

Collaborations

Throughout her career, Jyoti has collaborated with talented individuals such as Abhishek Chowdhury and Vijayabhaskara Venkatagiriyappa. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jyoti Prakash Deo exemplifies the spirit of innovation in the semiconductor industry. Her contributions to vacuum chucking technology are paving the way for advancements in substrate handling. Her work continues to inspire future generations of inventors and engineers.

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