This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Institute of Nuclear Energy Research, Atomic Energy Council. Active years: 2009-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Lujhu Township, Taoyuan County, TW (2009)
- Taoyuan County, TW (2010 - 2013)
Company Filing History:
Years Active: 2009-2013
Title: Jyh-Ming Yan: Innovator in Plasma Technology
Introduction
Jyh-Ming Yan is a notable inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of plasma technology, holding a total of 3 patents. His innovative work focuses on developing advanced plasma reactors and cleaning devices that utilize atmospheric gas discharge plasma.
Latest Patents
One of his latest inventions is the Dual-mode Plasma Reactor. This reactor features an air-buffering chamber, a magnetic element, and two electrodes that facilitate the generation of non-thermal plasma. The design includes a high-voltage power supply and an air-swirling chamber, which enhances the efficiency of the plasma generation process. Another significant patent is the Cleaning Device Using Atmospheric Gas Discharge Plasma. This device generates plasma in a gas whirlpool cavity and utilizes it to clean objects effectively. The process is designed to be simple, cost-effective, and capable of cleaning multiple objects in succession.
Career Highlights
Jyh-Ming Yan has worked with esteemed organizations such as the Atomic Energy Council and the Institute of Nuclear Energy Research. His experience in these institutions has allowed him to refine his expertise in nuclear energy and plasma technology.
Collaborations
Throughout his career, Yan has collaborated with notable colleagues, including Shiaw-Huei Chen and Ming-Song Yang. Their joint efforts have contributed to advancements in the field of plasma applications.
Conclusion
Jyh-Ming Yan's innovative contributions to plasma technology demonstrate his commitment to advancing scientific knowledge and practical applications. His patents reflect a deep understanding of plasma systems and their potential for various uses.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
