This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2018.
Company Filing History:
Years Active: 2018
Title: Jye-Fu Jeng: Innovator in Extreme Ultraviolet Lithography
Introduction
Jye-Fu Jeng is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly in the development of extreme ultraviolet (EUV) lithography systems. His innovative work has implications for the semiconductor manufacturing industry.
Latest Patents
Jye-Fu Jeng holds a patent for an "Extreme Ultraviolet Lithography System with Debris Trapper on Exhaust Line." This advanced EUV lithography system features a collector designed to collect and reflect EUV radiation. It includes a cover integrated with the collector, a first exhaust line connected to the cover to receive debris vapor from the collector, and a debris trapper connected to the first exhaust line to trap the debris vapor. Additionally, a second exhaust line is connected to the debris trapper, enhancing the system's efficiency and effectiveness.
Career Highlights
Jeng is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this esteemed company has allowed him to contribute to cutting-edge technologies that drive advancements in microelectronics.
Collaborations
Jye-Fu Jeng has collaborated with notable colleagues, including Shang-Chieh Chien and Kun-Jin Wu. Their combined expertise has fostered innovation and development in their respective fields.
Conclusion
Jye-Fu Jeng's contributions to extreme ultraviolet lithography represent a significant advancement in semiconductor technology. His innovative patent and collaboration with esteemed colleagues highlight his role as a key figure in the industry.