San Francisco, CA, United States of America

Justin Jones

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Justin Jones. Retrieved from https://idiyas.com/inventor/justin-jones-ahkuegpb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 2

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2001

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Justin Jones

Introduction

Justin Jones is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of technology, particularly in the area of semiconductor manufacturing. With a total of 2 patents, his work has had a considerable impact on the industry.

Latest Patents

Justin's latest patents include a method for treating a deposited film for resistivity reduction. This method focuses on reducing the resistivity of a copper layer on a wafer. A moisture-containing seed layer of copper is formed over a layer of material on a wafer. The copper seed layer is treated by either heat or ions from a plasma to anneal out moisture, thereby reducing its resistivity and improving its adhesion to the underlying layer. Following this, a moisture-free copper layer is deposited on top of the treated copper seed layer.

Another significant patent is related to chemical vapor deposition hardware and process. This invention provides a substrate support member and a purge guide for directing purge gas past the edge of a substrate and towards the outer perimeter of the chamber. The purge guide includes a plurality of holes disposed around the inner perimeter to provide a purge gas passage and to prevent purge gas from interfering with the deposition chemistry on the surface of the substrate. Additionally, the substrate support member includes a vacuum chuck for securing a substrate to its upper surface.

Career Highlights

Justin Jones is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to develop innovative solutions that enhance manufacturing processes and improve product quality.

Collaborations

Throughout his career, Justin has collaborated with talented individuals such as Mohan K Bhan and Mei Yin Chang. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

In summary, Justin Jones is an accomplished inventor whose work has significantly advanced the field of semiconductor manufacturing. His innovative patents and contributions to Applied Materials, Inc. highlight his dedication to improving technology and industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…