Jurgen Ramm

Title: The Innovative Mind of Jurgen Ramm

Introduction

Jurgen Ramm, an accomplished inventor based in Sevelen, Switzerland, has made significant contributions to the field of materials science and engineering. With a portfolio that includes four patents, Ramm's work focuses on advanced coating techniques and atomic layer deposition, which have applications in various high-tech industries.

Latest Patents

Ramm's latest patents showcase innovative methodologies in atomic layer deposition. One notable patent describes a process where substrates are charged with materials by placing them in an evacuated vacuum container and exposing their surfaces to a reactive gas. This gas is adsorbed onto the surface, and after terminating exposure, the adsorbed gas is allowed to react. The reaction is enhanced through low-energy plasma discharges, with ion energy ranging from 0 to 20 eV, and electron energy from 0 to 100 eV. The resulting materials can be tightly controlled, ranging from isolated atoms to continuous monolayers.

Additionally, Ramm has patented a method for producing coated workpieces utilizing Plasma-Enhanced Chemical Vapor Deposition (PECVD). This innovative system includes a vacuum chamber, a plasma discharge source connected to the vacuum recipient, and a workpiece holder designed to achieve high-quality coatings necessary for epitaxy. The plasma discharge source provides ions with energy below 15 eV, enabling the creation of precise coatings essential for advanced technological applications.

Career Highlights

Throughout his career, Jurgen Ramm has gained valuable experience working with reputable organizations, including Unaxis Trading AG and Unaxis-Balzers Aktiengesellschaft. His work in these companies has allowed him to further refine his expertise in plasma processing and material science.

Collaborations

Collaboration has been crucial to Ramm's success as an inventor. Notable colleagues, such as Carsten Rosenblad and Hans Von Känel, have joined forces with him on various projects, contributing to innovative solutions in materials engineering and enhancing the capabilities of their technologies.

Conclusion

Jurgen Ramm's contributions to the field of atomic layer deposition and PECVD demonstrate his expertise and innovative spirit. As a prolific inventor with a strong focus on advanced coating techniques, Ramm continues to push the boundaries of materials science, paving the way for future innovations in various high-tech sectors. His work not only emphasizes the importance of collaboration in technology development but also highlights the potential of scientific advancements in shaping the future.