Unaxis Trading Ag

Unaxis-balzers Aktiengesellschaft

Oc Oerlikon Balzers Ag

Jurgen Ramm

Carsten Rosenblad

Hans Von Känel

Hans Von K&auml;nel

Substrates are charged with a material by introducing the substrates into an evacuated vacuum container and exposing the surface of the substrates to a reactive gas which is adsorbed on the surface. The exposure is then terminated and the reactive gas adsorbed on the surface is allowed to react. The surface with the adsorbed reactive gas is exposed to a low-energy plasma discharge with ion energy Eon the surface of the substrate of 0&#x3c;E&#x2266;20 eV and an electron energy Eof 0 eV&#x3c;E&#x2266;100 eV. The adsorbed reactive gas is allowed to react at least with the cooperation of plasma-generated ions and electrons and wherein the density of the resulting material charging on the substrate surface is controlled to have a predetermined density ranging from isolated atoms, to forming a continuous monolayer.

Atomic layer deposition

A system and a method produce workpieces coated by PECVD with a quality sufficient for epitaxy. Included are a vacuum recipient, a plasma discharge source operationally connected to the vacuum recipient and a workpiece holder within the vacuum recipient, said plasma discharge source generating on said workpiece holder ions with an energy of below 15 eV. The plasma discharge source can be a low-voltage plasma discharge source in which at least one cathode is arranged within a cathode chamber coupled to the vacuum recipient by a diaphragm.

Method for producing coated workpieces, uses and installation for the method

Method for producing substrates charged with materials, including placing the substrate into an evacuated vacuum container. The substrate is exposed to a reactive gas which is adsorbed on the surface. The surface with the adsorbed reactive gas is exposed to a low-energy plasma discharge with ion energy E on the surface of the substrate of 0<E &lE;20 eV; and an electron energy E of 0 eV<E &lE;100 eV. The adsorbed reactive gas is allowed to react at least with the cooperation of plasma-generated ions and electrons.

Method for producing coated substrates

The method is characterized in that layers of sufficient quality for epitaxy are placed on workpieces, at a considerably increased deposition rate. To this end, instead of a UHV-CVD or ECR-CVD method, for example, a PECVD method is used by means of a DC plasma discharge.

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Sevelen, Switzerland

Jurgen Ramm