The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Oct. 25, 2001
Applicant:
Inventor:
Jurgen Ramm, Sevelen, CH;
Assignee:
Unaxis Balzers Aktiengesellschaft, Balzers, LI;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
Method for producing substrates charged with materials, including placing the substrate into an evacuated vacuum container. The substrate is exposed to a reactive gas which is adsorbed on the surface. The surface with the adsorbed reactive gas is exposed to a low-energy plasma discharge with ion energy E on the surface of the substrate of 0<E ≦20 eV; and an electron energy E of 0 eV<E ≦100 eV. The adsorbed reactive gas is allowed to react at least with the cooperation of plasma-generated ions and electrons.