Jurgen Hersener

Title: Jurgen Hersener: Innovator in X-ray Lithography

Introduction

Jurgen Hersener is a notable inventor based in Ulm, Germany. He has made significant contributions to the field of semiconductor manufacturing, particularly in X-ray lithography. With a total of 2 patents, his work focuses on enhancing the efficiency and reliability of semiconductor components.

Latest Patents

Hersener's latest patents include a mask for X-ray lithography and radiation-sensitive positively acting materials. The mask invention is designed for the economical and reliable manufacture of VLSI semiconductor components. It aims to transfer absorber structures down to the submicron range while avoiding lateral mechanical distortions through a tension-compensated carrier membrane made of simultaneously B and Ge doped silicon. This innovative carrier membrane is also more optically transparent than traditional Si membranes, facilitating better optical alignment of the mask. His second patent involves radiation-sensitive materials for various lithography techniques, based on linear non-crosslinked copolymers of acrylic or methacrylic acid. These copolymers are designed with side chains of varying lengths and include multiple monomers to enhance their effectiveness.

Career Highlights

Throughout his career, Jurgen Hersener has worked with prominent companies such as Licentia Patent-verwaltungs GmbH and Telefunken Electronic GmbH. His experience in these organizations has contributed to his expertise in patent development and semiconductor technology.

Collaborations

Hersener has collaborated with notable individuals in the field, including Hans-Joest Herzog and Karl Strohm. These partnerships have likely enriched his work and expanded his impact on the industry.

Conclusion

Jurgen Hersener's contributions to X-ray lithography and semiconductor manufacturing demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in the semiconductor industry.