The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1981
Filed:
Dec. 26, 1978
Jurgen Hersener, Ulm, DE;
Alfred Wilhelm, Ulm, DE;
Licentia Patent-Verwaltungs-G.m.b.H., Frankfurt am Main, DE;
Abstract
Radiation-sensitive positively acting materials for ultraviolet, electron beam or X-ray lithography based on linear non-crosslinked copolymers of acrylic acid or methacrylic acid or derivatives of these acids, which copolymers have side chains of different length. Copolymers are provided comprising three or more monomers and corresponding to the general form of copolymer ABC, in which monomer A represents a compound or several compounds of the formula: ##STR1## monomer B represents a compound of the formula: ##STR2## and monomer C represents a compound of the formula: ##STR3## in which R.sub.1, R.sub.2, R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are hydrogen atoms, acrylic or alkyl groups and R.sub.3 are ester or ketone groups.