Donaueschingen, Germany

Jurgen Funkhanel

This inventor holds 1 USPTO granted patent. Top assignee: Steag Micro Tech Gmbh. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jurgen Funkhanel. Retrieved from https://idiyas.com/inventor/jurgen-funkhanel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Jurgen Funkhanel: Innovator in Wet Treatment Technologies

Introduction

Jurgen Funkhanel is a notable inventor based in Donaueschingen, Germany. He has made significant contributions to the field of substrate treatment technologies. His innovative approach has led to the development of a unique patent that enhances the efficiency of wet treatment processes.

Latest Patents

Jurgen Funkhanel holds a patent for an "Installation for wet-treating substrates." This invention involves a device designed for the wet treatment of substrates within a container filled with treatment fluid. The design ensures optimal alignment and centering of the substrates during the treatment process, utilizing a substrate receiving device to facilitate lifting from the container.

Career Highlights

Funkhanel is associated with Steag Micro Tech GmbH, where he applies his expertise in developing advanced treatment technologies. His work has been instrumental in improving the efficiency and effectiveness of substrate processing.

Collaborations

Some of his notable coworkers include Dieter Meister and Martin Weber, who contribute to the innovative environment at Steag Micro Tech GmbH.

Conclusion

Jurgen Funkhanel's contributions to wet treatment technologies exemplify the impact of innovation in industrial processes. His patent reflects a commitment to enhancing substrate treatment efficiency, marking him as a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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