Aalen, Germany

Jurgen Faltus

This inventor holds 1 USPTO granted patent. Top assignee: Carl-Zeiss-Smt Ag. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jurgen Faltus. Retrieved from https://idiyas.com/inventor/jurgen-faltus

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Jurgen Faltus: Innovator in Facet Mirror Technology

Introduction

Jurgen Faltus is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optical technology, particularly with his innovative designs in facet mirrors. His work has led to advancements that enhance the functionality and efficiency of optical devices.

Latest Patents

Jurgen Faltus holds a patent for a facet mirror having a number of mirror facets. This invention features a facet mirror equipped with multiple mirror facets, each designed with a spherical or conical facet body that includes a reflecting surface. The unique design allows for improved optical performance, making it a valuable addition to the field.

Career Highlights

Faltus is associated with Carl Zeiss SMT AG, a leading company in the optical and industrial metrology sectors. His role at the company has allowed him to work on cutting-edge technologies that push the boundaries of optical design and application.

Collaborations

Throughout his career, Jurgen Faltus has collaborated with esteemed colleagues such as Hubert Holderer and Andreas Heisler. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Jurgen Faltus is a distinguished inventor whose work in facet mirror technology exemplifies the spirit of innovation. His contributions continue to influence the optical industry, showcasing the importance of creativity and collaboration in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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