Hassloch, Germany

Jürgen Ettmüller



Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Hassloch, DE (1999 - 2009)
  • Haβloch, DE (2010)

Company Filing History:


Years Active: 1999-2010

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5 patents (USPTO):Explore Patents

Title: Jürgen Ettmüller: Innovator in Reflectance Sensor Technology

Introduction

Jürgen Ettmüller is a notable inventor based in Hassloch, Germany. He has made significant contributions to the field of sensor technology, particularly in the measurement of reflectance in liquid samples. With a total of 5 patents to his name, Ettmüller has developed innovative solutions that enhance the accuracy and efficiency of various measurement processes.

Latest Patents

Ettmüller's latest patents include a precise flow-oriented multi-angle remission sensor. This invention features a three-dimensional flow cell designed for aligning non-isometric particles in a liquid sample across two axes. It also encompasses a method for aligning these particles, the use of the three-dimensional flow cell, and a reflectance sensor that incorporates this technology. Additionally, he has developed a method for measuring the reflectance of liquid samples containing non-isometric particles, along with the use of the reflectance sensor based on his invention. Another significant patent involves a reflectance sensor for measuring liquid pigment preparations or solid pigmented surfaces. This invention consists of an optical unit, a sample analysis unit, and a system control unit, along with a method for measuring the reflectance of liquid pigment preparations during various stages of production and processing.

Career Highlights

Throughout his career, Jürgen Ettmüller has worked with prominent companies such as BASF Aktiengesellschaft and BASF Corporation. His experience in these organizations has allowed him to refine his expertise in sensor technology and contribute to groundbreaking innovations in the field.

Collaborations

Ettmüller has collaborated with notable colleagues, including Matthias Radle and Michael Schäfer. These partnerships have fostered a creative environment that has led to the development of advanced technologies in reflectance measurement.

Conclusion

Jürgen Ettmüller stands out as an influential inventor in the realm of sensor technology. His innovative patents and collaborations have significantly advanced the measurement of reflectance in various applications. His work continues to impact the industry positively.

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