The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2006

Filed:

Jan. 03, 2002
Applicants:

Janusz Sadowski, Tampere, FI;

Jyrki Salminen, Porvoo, FI;

Peter Huber, Bad Homburg, DE;

Camie Heffels, Gernsheim, DE;

Marian Mours, Weisenheim am Sand, DE;

Klaus Reindel, Hassloch, DE;

Jürgen Ettmüller, Hassloch, DE;

Inventors:

Janusz Sadowski, Tampere, FI;

Jyrki Salminen, Porvoo, FI;

Peter Huber, Bad Homburg, DE;

Camie Heffels, Gernsheim, DE;

Marian Mours, Weisenheim am Sand, DE;

Klaus Reindel, Hassloch, DE;

Jürgen Ettmüller, Hassloch, DE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for monitoring of polymer in a liquid state, such as a polymer melt or resin, to detect inhomogeneities therein, such as the presence of other phase objects, especially gels in a matrix formed of the liquid state, the polymer in a liquid state flowing past an inspection point is monitored. At the inspection point, electromagnetic radiation in the form of UV light or polarised electromagnetic radiation is passed through the flow chamber () and received by a detector (), and the absorption of the UV light or the changes in the state of polarisation of the electromagnetic radiation caused by the inhomogeneities are used to observe them.


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