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Title: Juok Park: Innovator in Thin-Film Transistor Technology
Introduction
Juok Park is a notable inventor based in Asan-si, South Korea. He has made significant contributions to the field of thin-film transistors, particularly through his innovative patent. His work has implications for various electronic applications, showcasing his expertise in materials science and engineering.
Latest Patents
Juok Park holds a patent for a thin-film transistor and a zinc oxide-based sputtering target for the same. The thin-film transistor includes a metal electrode and a zinc oxide-based barrier film that effectively blocks material from diffusing out of the metal electrode. The barrier film is composed of zinc oxide doped with indium oxide, with the indium oxide content ranging from 1 to 50 percent by weight. Additionally, the sputtering target for deposition of the barrier film is also made of zinc oxide doped with indium oxide, maintaining the same weight percentage range.
Career Highlights
Throughout his career, Juok Park has worked with prominent companies in the technology sector. He has been associated with Samsung Corning Precision Materials Co., Ltd. and Samsung Display Co., Ltd. His experience in these organizations has allowed him to develop and refine his skills in the field of electronics and materials.
Collaborations
Juok Park has collaborated with several talented individuals in his field, including Jaewoo Park and Yoon Gyu Lee. These collaborations have contributed to the advancement of technology in thin-film transistors and related areas.
Conclusion
Juok Park's contributions to the field of thin-film transistors highlight his innovative spirit and technical expertise. His patent and work with leading companies underscore his role as a significant figure in the advancement of electronic materials.