Juo-Li Yang

Title: Innovations of Juo-Li Yang in Semiconductor Technology

Introduction

Juo-Li Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of Juo-Li Yang's latest patents involves a method of manufacturing a semiconductor device. In this method, a memory cell structure covered by a protective layer is formed in a memory cell area of a substrate. A mask pattern is created, featuring an opening over a first circuit area, while the memory cell area and a second circuit area are shielded by the mask pattern. The substrate in the first circuit area is recessed, while the memory cell area and the second circuit area remain protected. A first field effect transistor (FET) with a first gate dielectric layer is formed in the first circuit area over the recessed substrate, and a second FET with a second gate dielectric layer is formed in the second circuit area over the substrate as viewed in cross-section.

Career Highlights

Juo-Li Yang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have positioned him as a key player in the development of advanced semiconductor technologies.

Collaborations

Throughout his career, Juo-Li Yang has collaborated with notable colleagues, including Chen-Chin Liu and Wei Cheng Wu. These collaborations have further enhanced his contributions to the field.

Conclusion

Juo-Li Yang's work in semiconductor technology exemplifies the importance of innovation in advancing electronic devices. His patents and career achievements reflect his commitment to pushing the boundaries of what is possible in the semiconductor industry.