Miyagi, Japan

Junya Kato

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junya Kato. Retrieved from https://idiyas.com/inventor/junya-kato-c4o1j4vn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Junya Kato: Innovator in Plasma Processing Technology

Introduction

Junya Kato is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus and method.

Latest Patents

Junya Kato holds 1 patent for his invention titled "Plasma processing apparatus and plasma processing method." This patent describes a plasma processing apparatus where a controller specifies a time point when a current begins to flow between an edge ring and a DC power supply. The controller also estimates a self-bias voltage generated by the supply of radio frequency power, ensuring optimal performance of the apparatus.

Career Highlights

Junya Kato is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to focus on advancing plasma processing technologies, which are crucial for various applications in electronics.

Collaborations

Some of Junya Kato's coworkers include Toshiaki Saijo and Jun Abe. Their collaboration has fostered an environment of innovation and creativity within the company.

Conclusion

Junya Kato's contributions to plasma processing technology exemplify the impact of dedicated inventors in advancing industrial applications. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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