Junro Sakai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 10 patents to his name, Sakai's work has advanced the capabilities of substrate processing devices.

Latest Patents

Sakai's latest patents include a substrate processing device and method that utilizes a magnetic field to enhance film formation on substrates. This innovative device features a magnet arranged around a substrate holder, allowing for independent control of both the magnet and the substrate holder's rotation. Additionally, it incorporates detection devices to align the substrate's orientation with the magnetic field direction. Another notable patent involves a substrate processing device that employs a can-seal type magnetic coupling mechanism, enabling the rotational movement of an interior rotating body within a vacuum chamber, controlled by an exterior rotating body.

Career Highlights

Throughout his career, Junro Sakai has worked with notable companies such as Anelva Corporation and NEC Corporation. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Sakai has collaborated with esteemed colleagues, including Ken-ichi Aketagawa and Toru Tatsumi. Their joint efforts have furthered advancements in the field of substrate processing.

Conclusion

Junro Sakai's innovative contributions to substrate processing technology have established him as a key figure in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of substrate processing devices.

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