Beijing, China

Junmao Wang

This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2018.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Junmao Wang: Innovator in Overlay Key Technology

Introduction

Junmao Wang is a prominent inventor based in Beijing, China. He has made significant contributions to the field of overlay key technology, showcasing his expertise through innovative patents. His work is particularly relevant in the realm of precision measurement and semiconductor manufacturing.

Latest Patents

Junmao Wang holds a patent for an "Overlay key, method of forming the same, and method of measuring overlay accuracy." This patent includes embodiments that disclose an overlay key featuring at least two overlay marks. Each mark has a first sub-mark and a second sub-mark that are centro-symmetrical to each other. The sub-marks consist of two bar patterns that are perpendicular to each other and share a common end. Notably, at least two of the overlay marks are situated in different layers. The patent also outlines methods for forming the overlay key and measuring overlay accuracy.

Career Highlights

Throughout his career, Junmao Wang has worked with leading companies in the optoelectronics sector. He has been associated with Hefei Boe Optoelectronics Technology Co., Ltd. and Boe Technology Group Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative ideas.

Collaborations

Junmao Wang has collaborated with notable professionals in his field, including Yuhu Zhang and Bin Nie. These partnerships have contributed to the advancement of his research and the successful implementation of his inventions.

Conclusion

Junmao Wang is a distinguished inventor whose work in overlay key technology has made a significant impact in the industry. His innovative patent and collaborations highlight his commitment to advancing technology in precision measurement.

Profile summary based on public USPTO records.
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