Company Filing History:
Years Active: 2002-2007
Title: Junko Ohuchi: Innovator in Semiconductor Manufacturing
Introduction
Junko Ohuchi is a prominent inventor based in Yokohama, Japan. She has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. Her innovative approaches have paved the way for advancements in pattern formation techniques.
Latest Patents
Ohuchi's latest patents include a method for forming patterns that involves creating a masking material layer on a working film. This process utilizes a solution of a mixture comprising an inorganic compound and a volatile unit. The method allows for the formation of a porous masking material layer, which is essential for dry-etching the working film to create precise patterns. Another notable patent is a high precision pattern forming method for manufacturing semiconductor devices. This method employs a soluble thin film that can be easily removed, enhancing the efficiency of the manufacturing process.
Career Highlights
Junko Ohuchi is currently associated with Kabushiki Kaisha Toshiba, where she continues to innovate in semiconductor technology. Her work has been instrumental in improving the manufacturing processes of semiconductor devices, making them more efficient and precise.
Collaborations
Ohuchi has collaborated with notable colleagues such as Yasuhiko Sato and Tokuhisa Ohiwa. These collaborations have further enriched her research and development efforts in the semiconductor field.
Conclusion
Junko Ohuchi's contributions to semiconductor manufacturing through her innovative patents and collaborations highlight her as a key figure in the industry. Her work continues to influence advancements in technology and manufacturing processes.