Tokyo, Japan

Junko Mine

This inventor holds 4 USPTO granted patents and 3 published patent applications. Top assignees: Ebara Corporation, Screen Holdings Co., Ltd.. Active years: 2016-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junko Mine. Retrieved from https://idiyas.com/inventor/junko-mine

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016-2019

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4 patents (USPTO):Explore Patents

Title: Junko Mine: Patent Inventor in Tokyo

Introduction

Junko Mine is an inventor based in Tokyo, Japan. Her patent work includes plating technologies designed to improve the uniformity of films deposited on polygonal substrates. She is associated with Ebara Corporation and Screen Holdings Co., Ltd. Mine has 4 patents.

Latest Patents

One of Mine’s latest listed inventions is titled “Plating Apparatus, Plating Method, and Substrate Holder.” The invention addresses in-plane uniformity when plating a polygonal substrate.

The disclosed system includes an anode holder, a substrate holder, a plating bath, and a control device that regulates current flowing between the anode and substrate. The substrate holder has multiple power-feeding members positioned along the substrate’s sides. The control device can supply at least two different current values simultaneously to those members, enabling control of the plating process across the substrate.

Career Highlights

Mine’s listed company affiliations include Ebara Corporation and Screen Holdings Co., Ltd. Her patent portfolio includes work on plating apparatus, methods, and substrate holders.

Collaborations

The provided information lists Tsutomu Nakada and Mitsutoshi Yahagi as Mine’s coworkers. Their names are associated with her professional and patent-related work.

Conclusion

Junko Mine’s patent work focuses on plating technology, particularly methods for improving film uniformity on polygonal substrates. Her listed affiliations and collaborations provide context for her contributions as an inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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