This inventor holds 1 USPTO granted patent. Top assignees: Korea Advanced Institute of Science and Technology, Samsung Electronics Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 2,790 
1 out of 6,229 Years Active: 2026
Title: Junill Ryu - Innovator in Immersion Lithography
Introduction
Junill Ryu is an inventor based in Daejeon, South Korea. He is known for his innovative work in the field of immersion lithography. Although he currently holds no granted patents, his contributions to the field are noteworthy.
Latest Patent Applications
Junill Ryu's latest patent application is for an "IMMERSION LITHOGRAPHIC SYSTEM." This system includes a wafer stage designed to support a wafer, a projection optical system configured to irradiate light toward the wafer, and a liquid supply unit that provides a liquid between the wafer stage and the projection optical system. This setup forms an immersion lens through which the light is transmitted. Additionally, a vapor supply unit is included to supply vapors to the immersion lens, with both the immersion lens and the vapor supply unit aligned in a vertical direction.
Conclusion
Junill Ryu's work in immersion lithography represents a significant step forward in the field, showcasing his innovative approach to technology. His ongoing efforts in patent applications highlight his commitment to advancing this area of research.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile