The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Jun. 20, 2023
Samsung Electronics Co., Ltd., Suwon-si, KR;
Wonki Lee, Suwon-si, KR;
Hyoungsoo Kim, Daejeon, KR;
Junill Ryu, Daejeon, KR;
Namil Koo, Suwon-si, KR;
Jongmin Yoon, Suwon-si, KR;
Suhwan Park, Suwon-si, KR;
Sangyeon Oh, Suwon-si, KR;
Gilgu Lee, Daejeon, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
An immersion lithographic system may include a wafer stage configured to support a wafer, a projection optical system on the wafer stage and configured to irradiate light toward the wafer, a liquid supply unit configured to supply a liquid between the wafer stage and the projection optical system to form an immersion lens through which the light is transmitted, and a vapor supply unit configured to supply vapors to the immersion lens. The immersion lens and the vapor supply unit may be aligned in a vertical direction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile