Yamanashi, Japan

Junichi Ogawa

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Ogawa. Retrieved from https://idiyas.com/inventor/junichi-ogawa-4x9oqku5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Yamanshi, JP (2017)
  • Nirasaki, JP (2017)

Company Filing History:


Years Active: 2017

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Junichi Ogawa: Innovator in Substrate Processing Technology

Introduction

Junichi Ogawa is a prominent inventor based in Yamanshi, Japan. He has made significant contributions to the field of substrate processing technology, holding 2 patents that showcase his innovative approach to enhancing processing systems.

Latest Patents

Ogawa's latest patents include a "Substrate Processing System" and a "Substrate Processing Apparatus." The substrate processing system is designed for sequentially processing substrates and includes processing chambers, a transfer unit, and a control unit. This control unit manages the operation of the transfer unit and processing chambers, ensuring that substrates are not processed simultaneously in all chambers during a single conditioning cycle. The substrate processing apparatus features multiple processing modules, a transfer mechanism, and a controller that outputs control signals for transferring substrates along a predetermined path. This apparatus allows for efficient processing based on a set processing recipe, enhancing the overall functionality of substrate processing.

Career Highlights

Junichi Ogawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work focuses on developing advanced substrate processing technologies that improve efficiency and effectiveness in manufacturing processes.

Collaborations

Ogawa has collaborated with notable coworkers, including Youichi Nakayama and Keiji Osada, contributing to the advancement of substrate processing technologies through teamwork and shared expertise.

Conclusion

Junichi Ogawa's innovative work in substrate processing technology has positioned him as a key figure in the industry. His patents reflect a commitment to improving processing systems, making significant strides in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…