Kumamoto, Japan

Junichi Iwano

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Iwano. Retrieved from https://idiyas.com/inventor/junichi-iwano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Junichi Iwano: Inventor of a Temperature-Controlled Liquid Coating Apparatus

Introduction

Junichi Iwano is an inventor associated with Kumamoto, Japan, and Tokyo Electron Limited. His patent work includes an apparatus designed to control the temperature of processing solution during substrate coating. The available information lists 1 patent for him.

Latest Patents

**Liquid Coating Apparatus with Temperature Controlling Manifold** describes a substrate-processing apparatus with a holder and a supply pipe that delivers processing solution to the substrate. One temperature controller regulates the area near the pipe’s outlet, where the solution is applied. A second controller uses water drained from the first controller to regulate the area near the pipe’s inlet. This arrangement reuses temperature-controlled water to manage the solution’s temperature at different points in the delivery process.

Career Highlights

Iwano’s listed invention addresses temperature management in liquid coating equipment. The patent describes a system intended to control processing-solution temperature near both the supply pipe’s inlet and its application point.

Collaborations

The provided information identifies Jun Ookura and Seiki Ishida as Iwano’s coworkers. It does not specify their roles in the patent or the invention.

Conclusion

Junichi Iwano’s listed patent presents a temperature-control approach for substrate coating that reuses conditioned water within the apparatus.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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