Fukaya, Japan

Junichi Chonan

This inventor holds 4 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignee: Nikon Corporation. Active years: 2015-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Chonan. Retrieved from https://idiyas.com/inventor/junichi-chonan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.2

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2019

Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: Junichi Chonan: Innovator in Exposure Technology

Introduction

Junichi Chonan is a prominent inventor based in Fukaya, Japan. He has made significant contributions to the field of exposure technology, holding a total of 4 patents. His work primarily focuses on methods and apparatuses that enhance the efficiency and effectiveness of device manufacturing processes.

Latest Patents

Chonan's latest patents include innovative designs for exposure apparatuses and methods. One notable patent describes an exposure apparatus that exposes a substrate with exposure light via a liquid. This apparatus features an optical system with an emission surface from which the exposure light is emitted. It also includes a liquid supply port that fills the optical path of the exposure light with liquid. Additionally, a fluid supply port is incorporated to supply a fluid containing a material that can change the specific resistance of the liquid, enhancing the immersion space formed by the liquid.

Career Highlights

Chonan is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to push the boundaries of exposure technology, contributing to advancements in the manufacturing of high-precision devices.

Collaborations

Throughout his career, Chonan has collaborated with notable colleagues, including Isao Sugaya and Hidehiro Maeda. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in the field.

Conclusion

Junichi Chonan's innovative work in exposure technology has made a significant impact on the industry. His patents and contributions continue to shape the future of device manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…