Miyagi, Japan

Junichi Akiba

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Junichi Akiba. Retrieved from https://idiyas.com/inventor/junichi-akiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Junichi Akiba and Gas-Flow Measurement in Substrate Processing

Introduction

Junichi Akiba is an inventor associated with Miyagi, Japan, and Tokyo Electron Limited. His patent work addresses how to determine the output flow rate of gas supplied by a flow rate controller in a substrate processing apparatus.

Latest Patents

The provided information lists one patent for Akiba: “Method of determining output flow rate of gas output by flow rate controller of substrate processing apparatus.” The method selects one of two pressure sensors according to the set flow rate, with the second sensor capable of measuring a higher maximum pressure than the first. It determines a target chamber pressure based on the set flow rate, then measures chamber pressure with the selected sensor while gas flows into the chamber and the pressure controller is closed. The flow controller’s output rate is calculated from the chamber’s rate of pressure rise. Akiba is credited with 1 patent.

Career Highlights

Akiba’s listed invention concerns pressure-based measurement of gas flow in substrate-processing equipment. The approach uses sensor selection and chamber-pressure changes to determine the flow controller’s output rate.

Collaborations

The supplied information identifies Shinichiro Hayasaka and Toshihiro Tsuruta as Akiba’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Junichi Akiba’s listed patent focuses on determining gas output flow rates through chamber-pressure measurements, reflecting his association with substrate-processing technology at Tokyo Electron Limited.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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