Junhan Liu

Title: Innovations of Junhan Liu

Introduction

Junhan Liu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, particularly through his innovative designs and methods. With a total of 2 patents, Liu continues to push the boundaries of technology.

Latest Patents

Liu's latest patents include a method of sub resolution assist feature. This invention discloses a design method that involves forming a sub resolution assist feature in the mask plate. The upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate. Additionally, a process pattern is formed on one side of the mask plate, which contains the sub resolution assist feature. The position of the process pattern does not superpose with the sub resolution assist feature in a vertical direction.

Career Highlights

Junhan Liu is currently employed at Shanghai Huali Microelectronics Corporation. His work at this company has allowed him to develop and refine his innovative ideas in microelectronics. Liu's expertise and dedication have made him a valuable asset to his team.

Collaborations

Liu collaborates with various professionals in his field, including his coworker Zhigang Chen. Their combined efforts contribute to the advancement of technology and innovation in microelectronics.

Conclusion

Junhan Liu's contributions to the field of microelectronics through his patents and work at Shanghai Huali Microelectronics Corporation highlight his role as an influential inventor. His innovative methods continue to shape the industry and inspire future advancements.