The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2020
Filed:
Dec. 03, 2019
Applicant:
Shanghai Huali Microelectronics Corporation, Shanghai, CN;
Inventors:
Zhigang Chen, Shanghai, CN;
Junhan Liu, Shanghai, CN;
Assignee:
SHANGHAI HUALI MICROELECTRONICS CORPORATION, Shanghai, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01);
Abstract
The present invention discloses a design method of a sub resolution assist feature, which comprises the following steps of: S: forming a sub resolution assist feature in the mask plate, the upper surface of the sub resolution assist feature is aligned with the upper surface of the mask plate; S: forming a process pattern on one side, which contains the sub resolution assist feature, of the mask plate, the position of the process pattern is not superposed with the sub resolution assist feature in a vertical direction.