Suwon-si, South Korea

Jungmin You

This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jungmin You. Retrieved from https://idiyas.com/inventor/jungmin-you-j81bex0s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Jungmin You: Innovator in Memory Technology

Introduction

Jungmin You is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of memory technology, particularly in the management of row hammer attacks. His innovative work has led to the development of a patented device that enhances memory controller operations.

Latest Patents

Jungmin You holds a patent for a "Device, operating method, memory device, and CXL memory expansion device." This invention provides a comprehensive solution for managing row hammer attacks. The device includes a volatile memory and a memory controller designed to detect patterns of row hammer attack based on input row addresses. It determines whether to perform refresh management according to the type of row distribution, ensuring efficient memory operation.

Career Highlights

Jungmin You is currently employed at Samsung Electronics Ltd., a leading company in technology and innovation. His work at Samsung has allowed him to focus on advancing memory technology and addressing critical challenges in the field.

Collaborations

Jungmin collaborates with talented coworkers, including Kyomin Sohn and Sunghye Cho. Their combined expertise contributes to the innovative projects at Samsung Electronics Ltd.

Conclusion

Jungmin You's contributions to memory technology through his patent demonstrate his commitment to innovation and excellence. His work not only addresses current challenges but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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