Gyeonggi-do, South Korea

Jung-Rak Lee

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2016

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2 patents (USPTO):Explore Patents

Title: Innovations of Jung-Rak Lee

Introduction

Jung-Rak Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of substrate processing apparatuses.

Latest Patents

Jung-Rak Lee's latest patents include innovative technologies that improve substrate processing. The first patent, titled "Power supplying means having shielding means for feeding line and substrate processing apparatus including the same," describes a substrate processing apparatus that features a process chamber, a source electrode, and a radio frequency (RF) power source. This invention includes a feeding line that connects the source electrode to the RF power source, along with a shielding part that wraps the feeding line to block electric fields.

The second patent, "Gas distributing device and substrate processing apparatus including the same," outlines a gas distribution device for a substrate treating apparatus. This device consists of multiple plasma source electrodes and plasma ground electrodes that are alternately arranged. It also includes a gas providing part at each plasma source electrode, which facilitates the distribution of process gas between the electrodes.

Career Highlights

Jung-Rak Lee is currently employed at Jusung Engineering Co., Ltd., where he continues to develop innovative solutions in substrate processing technology. His work has contributed to advancements in the efficiency of semiconductor manufacturing processes.

Collaborations

Throughout his career, Jung-Rak Lee has collaborated with notable colleagues, including Jae-Chul Do and Bu-Il Jeon. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Jung-Rak Lee's contributions to substrate processing technology through his patents demonstrate his commitment to innovation in the field. His work at Jusung Engineering Co., Ltd. continues to influence advancements in semiconductor manufacturing.

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