The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2016
Filed:
Jun. 30, 2011
Applicants:
Jae-chul DO, Daegu, KR;
Bu-il Jeon, Gyeonggi-do, KR;
Myung-gon Song, Jeollanam-do, KR;
Jung-rak Lee, Gyeonggi-do, KR;
Inventors:
Jae-Chul Do, Daegu, KR;
Bu-Il Jeon, Gyeonggi-do, KR;
Myung-Gon Song, Jeollanam-do, KR;
Jung-Rak Lee, Gyeonggi-do, KR;
Assignee:
JUSUNG ENGINEERING CO., LTD., , KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); H05K 9/00 (2006.01);
U.S. Cl.
CPC ...
H05K 9/00 (2013.01); C23C 16/50 (2013.01); C23C 16/505 (2013.01); H01J 37/3244 (2013.01); H01J 37/32091 (2013.01); H01J 37/32532 (2013.01); H01J 37/32568 (2013.01); H01J 37/32577 (2013.01);
Abstract
A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the source electrode and the RF power source; and a shielding part wrapping the feeding line to block an electric field.