The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Jun. 23, 2011
Jae-chul DO, Daegu, KR;
Bu-il Jeon, Gyeonggi-do, KR;
Myung-gon Song, Jeollanam-do, KR;
Jung-rak Lee, Gyeonggi-do, KR;
Jae-Chul Do, Daegu, KR;
Bu-Il Jeon, Gyeonggi-do, KR;
Myung-Gon Song, Jeollanam-do, KR;
Jung-Rak Lee, Gyeonggi-do, KR;
Jusung Engineering Co., Ltd., , KR;
Abstract
A gas distribution device for a substrate treating apparatus includes a plurality of plasma source electrodes having a first side surface; a plurality of plasma ground electrodes having a second side surface facing the first side surface, the plurality of plasma ground electrodes being alternately arranged with the plurality of plasma source electrodes; and a first gas providing part disposed at each plasma source electrode and including a first space, a plurality of first through-holes in communication with the first space for providing a first process gas between one of the plurality of plasma source electrodes and a corresponding ones of the plurality of plasma ground electrodes, and a first discharging portion at the first side surface.