Hsinchu, Taiwan

Jung-Ke Yeh

This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1999-2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Ke Yeh. Retrieved from https://idiyas.com/inventor/jung-ke-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 1999-2000

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3 patents (USPTO):Explore Patents

Title: Innovative Contributions of Jung-Ke Yeh in Semiconductor Technology

Introduction

Jung-Ke Yeh, an esteemed inventor based in Hsin-Chu, Taiwan, has made significant strides in the field of semiconductor technology. With a total of three patents to his name, his innovative approaches have contributed to advancements in memory cell fabrication and semiconductor device efficiency.

Latest Patents

Among his latest patents, the "Method to fabricate sharp tip of poly in split gate flash" stands out. This patent describes a groundbreaking method that enables the formation of a split-gate flash memory cell with a sharp polysilicon (poly) tip, greatly enhancing the erase speed of the cell. The process eliminates the need for conventional oxidation of the polysilicon floating gate, utilizing a high-pressure etching recipe instead. This innovative technique creates a recess with a sloped profile, which is subsequently filled with a top-oxide that serves as a hard mask. The sharp poly tip generated by this method is resistant to damage from traditional oxidation processes, ultimately leading to improved performance for split-gate flash memory cells.

Another significant invention of Yeh is the "High breakdown voltage twin well device with source/drain regions widely." This patent outlines the architecture of a field-effect transistor (FET) semiconductor device, featuring a doped silicon substrate enhanced with a dual well configuration. It details the specific arrangement of the source and drain regions in relation to the gate electrode structure, emphasizing self-alignment and efficient spacing from field oxide regions to maximize device efficacy.

Career Highlights

Jung-Ke Yeh is currently associated with Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His commitment to advancing technology has positioned him as a key figure in the field, influencing both research and practical applications.

Collaborations

Throughout his career, Yeh has collaborated with various professionals, including notable coworkers Jian-Hsing Lee and Kuo-Reay Peng. These partnerships have fostered a collaborative environment that promotes the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Jung-Ke Yeh's contributions to the semiconductor field through his patents reflect a dedication to innovation and efficiency. His work not only enhances the performance of flash memory cells and semiconductor devices but also sets a foundation for future advancements in technology. As the industry evolves, the impact of Yeh's inventions will continue to resonate, showcasing the importance of creativity and perseverance in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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