Jung H Woo

Title: Jung H Woo: Innovator in Photolithography Process Variability

Introduction

Jung H Woo is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of photolithography process variability. With a total of 2 patents to his name, his work has had a substantial impact on the industry.

Latest Patents

Jung H Woo's latest patents focus on systems and methods for stochastic models of mask process variability. These patents disclose innovative approaches for creating a stochastic model of mask process variability in photolithography processes. One embodiment of his work involves a stochastic error model based on a probability distribution of mask process error. This model generates multiple mask layouts that incorporate stochastic errors, including random and non-uniform variations of contacts. Additionally, the stochastic model can be applied to critical dimension uniformity (CDU) optimization and design rule (DR) sophistication.

Career Highlights

Jung H Woo is currently employed at Micron Technology Incorporated, where he continues to advance his research and development efforts. His expertise in semiconductor manufacturing has positioned him as a key player in the industry.

Collaborations

Jung H Woo collaborates with Ming-Chuan Yang, working together to push the boundaries of innovation in their field.

Conclusion

Jung H Woo's contributions to the field of photolithography and semiconductor manufacturing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of process variability and optimization, making him a valuable asset to Micron Technology Incorporated and the broader technological community.