Cheonan-shi, South Korea

Jung-Gwan Kim


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: Innovations of Jung-Gwan Kim in Wafer Cleaning Technology.

Introduction

Jung-Gwan Kim is a notable inventor based in Cheonan-shi, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of wafer cleaning technology. His innovative approach aims to enhance the efficiency and yield rate of wafers used in various electronic applications.

Latest Patents

Jung-Gwan Kim holds a patent for an "Apparatus for cleaning the edges of wafers." This invention addresses the challenges associated with wafer contamination during the cleaning process. The apparatus is designed to be relatively simple and cost-effective, preventing re-contamination of the wafer edges. It features a cleaning agent ejection nozzle body that directs a particulate cleaning agent towards the side and edge portions of the wafer, which is held and rotated by a chuck. Additionally, the nozzle body carriage allows for movement between rest and cleaning positions, optimizing the cleaning process.

Career Highlights

Throughout his career, Jung-Gwan Kim has demonstrated a commitment to innovation in the semiconductor industry. His work has contributed to advancements in wafer processing techniques, which are crucial for the production of high-quality electronic components. His patent reflects his dedication to improving manufacturing processes and increasing yield rates.

Collaborations

Jung-Gwan Kim has collaborated with talented individuals such as Se-Jong Ko and Cheol-Nam Yoon. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in wafer cleaning and semiconductor manufacturing.

Conclusion

Jung-Gwan Kim's contributions to wafer cleaning technology exemplify the importance of innovation in the semiconductor industry. His patented apparatus not only enhances the cleaning process but also significantly improves the yield rate of wafers. His work continues to influence the field and drive advancements in manufacturing efficiency.

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