The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Dec. 14, 2001
Se-jong Ko, Pyeongtaek-shi, KR;
Jung-gwan Kim, Cheonan-shi, KR;
Cheol-nam Yoon, Ansong-shi, KR;
Jeong-ho Lee, Inchon Metropolitan, KR;
Se-Jong Ko, Pyeongtaek-shi, KR;
Jung-Gwan Kim, Cheonan-shi, KR;
Cheol-Nam Yoon, Ansong-shi, KR;
Jeong-Ho Lee, Inchon Metropolitan, KR;
K. C. Tech Co., Ltd., Kyonggi-Do, KR;
Abstract
The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus includes a cleaning agent ejection nozzle body provided on a side part of a chuck for ejecting a particulate cleaning agent (COparticles) towards the side and the edge portions of the wafer held and rotated by the chuck, and a nozzle body carriage for moving the nozzle body between rest and cleaning positions.