Campbell, CA, United States of America

Jun Pei


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 77(Granted Patents)


Company Filing History:


Years Active: 2003

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3 patents (USPTO):Explore Patents

Title: Jun Pei: Innovator in Electron Beam Inspection Technology

Introduction

Jun Pei is a notable inventor based in Campbell, California. He has made significant contributions to the field of electron beam inspection and metrology. With a total of 3 patents, his work focuses on optimizing imaging techniques for various applications.

Latest Patents

One of Jun Pei's latest patents is titled "In-situ probe for optimizing electron beam inspection and metrology based on surface potential." This invention discloses a method and apparatus for generating an image from a sample. The apparatus includes a charged particle beam generator that generates and controls a charged particle beam directed towards a portion of the sample. A detector is used to detect charged particles originating from the sample, allowing for the generation of an image. Additionally, a measurement device measures the surface voltage value of the exposed sample portion. The process involves adjusting operating conditions to find optimum settings for the charged particle beam.

Another significant patent is "Simultaneous flooding and inspection for charge control in an electron beam inspection machine." This invention further enhances the capabilities of electron beam inspection technology.

Career Highlights

Jun Pei has worked with prominent companies in the technology sector, including KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. His experience in these organizations has contributed to his expertise in electron beam inspection technologies.

Collaborations

Throughout his career, Jun Pei has collaborated with notable colleagues such as Mark Armstrong McCord and Jan A Lauber. These collaborations have likely enriched his work and led to innovative advancements in his field.

Conclusion

Jun Pei's contributions to electron beam inspection technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving imaging techniques and optimizing operational conditions.

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