Tokyo, Japan

Jun Odake

This inventor holds 10 USPTO granted patents. Top assignee: Mitutoyo Corporation. Active years: 2003-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jun Odake. Retrieved from https://idiyas.com/inventor/jun-odake

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 90.0

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 113(Granted Patents)


Location History:

  • Ohta-ku, JP (2003)
  • Tokyo, JP (2018 - 2022)

Company Filing History:


Years Active: 2003-2026

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10 patents (USPTO):Explore Patents

Title: Innovations of Jun Odake

Introduction

Jun Odake is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of measurement technology, holding a total of nine patents. His work primarily focuses on precision instruments that enhance measurement accuracy.

Latest Patents

Among his latest innovations is a surface roughness measuring device, which is designed to provide precise measurements of surface textures. Additionally, he has developed a micrometer that further advances the capabilities of measurement tools in various applications.

Career Highlights

Jun Odake is currently employed at Mitutoyo Corporation, a leading company in the field of precision measurement instruments. His role at Mitutoyo has allowed him to contribute to the development of cutting-edge technologies that are widely used in various industries.

Collaborations

Throughout his career, Jun has collaborated with talented individuals such as Sadayuki Matsumiya and Yu Sugai, who is a skilled woman in the field. These collaborations have fostered innovation and have led to the successful development of various measurement technologies.

Conclusion

Jun Odake's contributions to measurement technology through his patents and collaborations highlight his importance in the field. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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