This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Innovations of Jun Maeda in Semiconductor Technology
Introduction
Jun Maeda is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of photoresist processes. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.
Latest Patents
One of Jun Maeda's key patents is titled "Method for avoiding photo residue in dual damascene with acid treatment." This patent describes a process involving a substrate where a first dielectric layer is formed through deposition. An etching stop layer and a second dielectric layer are subsequently created over the first dielectric. The process includes treating the second dielectric layer with Lewis acid, defining a first photoresist layer, and performing dry etching to form a via hole. The method further details the treatment of the surface of the second dielectric layer and the via hole with Lewis acid, followed by the definition of a second photoresist layer. The dry etching process continues until the etching stop layer serves as a terminal point, allowing for the formation of a trench larger than the via hole. Finally, the second photoresist layer is removed to create the opening of the damascene.
Career Highlights
Jun Maeda is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing processes that improve the manufacturing of integrated circuits. With a total of 1 patent, he has established himself as a valuable contributor to the field.
Collaborations
Jun Maeda has collaborated with several talented individuals, including Anseime Chen and Sheng-Yueh Chang. Their combined expertise has fostered an environment of innovation and creativity within their projects.
Conclusion
Jun Maeda's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the field. His work continues to influence the industry and pave the way for future developments.