This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Materials Corporation. Active years: 1999.
Company Filing History:
Years Active: 1999
Title: Jun-ichi Oda: Innovator in Sputtering Technology
Introduction
Jun-ichi Oda is a notable inventor based in Sanda, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering targets for depositing ferroelectric films. His innovative work has implications for various applications in electronics and materials engineering.
Latest Patents
Jun-ichi Oda holds a patent for a sputtering target designed for depositing ferroelectric films. The patent describes sputtering targets that are resistant to crack generation during the sputtering process. The targets consist of a disk formed from a sintered material that includes a compound oxide of barium and titanium, strontium and titanium, or a combination of both. The surface of the disk target is ground to create a specific scratch pattern that radiates from an arbitrary point, enhancing its performance during use.
Career Highlights
Oda is associated with Mitsubishi Materials Corporation, where he has been able to apply his expertise in materials science. His work has contributed to advancements in the manufacturing processes of electronic components, particularly those that require high-quality ferroelectric films.
Collaborations
Some of Jun-ichi Oda's coworkers include Akifumi Mishima and Ichirou Shiono. Their collaborative efforts have likely played a role in the successful development of innovative materials and technologies within the company.
Conclusion
Jun-ichi Oda's contributions to sputtering technology and ferroelectric film deposition highlight his role as an important inventor in the field. His patent reflects a commitment to advancing materials science and improving manufacturing processes.