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Years Active: 2001-2013
Title: Jun Fukuda: Innovator in Semiconductor Technology
Introduction
Jun Fukuda is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, particularly in improving moisture resistance in ferroelectric random-access memory (FeRAM) devices. With a total of 4 patents to his name, Fukuda's work has had a lasting impact on the industry.
Latest Patents
Fukuda's latest patent focuses on a semiconductor device and manufacturing method that enhances moisture resistance in FeRAM. The invention involves a process where, after a probe test using a pad, a metal film is formed to cover the pad within an opening of a protective film. This metal film extends from the pad to the outer periphery of the protective film. A metal bump is then formed on this metal film, which consists of a two-layer structure made of first and second metal films. The materials for these layers are carefully selected to ensure optimal adhesion to both the protective film and the metal bump. The film formation conditions are meticulously set to achieve the desired quality and thickness of the metal films. This innovative approach effectively prevents moisture penetration into the ferroelectric capacitor, thereby reducing the risk of potential inversion abnormalities caused by moisture.
Career Highlights
Throughout his career, Jun Fukuda has worked with notable companies such as Fujitsu Semiconductor Limited and Fujitsu Microelectronics Limited. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various advancements in the field.
Collaborations
Fukuda has collaborated with several professionals in his field, including Hirohisa Matsuki, who has been a significant coworker in his projects.
Conclusion
Jun Fukuda's innovative work in semiconductor technology, particularly in enhancing moisture resistance in FeRAM devices, showcases his dedication to advancing the field. His contributions through his patents and collaborations continue to influence the industry positively.