This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Chemical Corporation. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Jun Fujita - Innovator in Radiation Sensitive Compositions
Introduction
Jun Fujita is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of radiation sensitive compositions. His work is recognized for its innovative approach and practical applications in various industries.
Latest Patents
Fujita holds a patent for a radiation sensitive composition. This composition comprises a film-forming resin and a bis(sulfonyl)diazomethane compound. The formula includes various substituents, allowing for a range of applications in technology and materials science. His patent is a testament to his expertise and creativity in the field.
Career Highlights
Fujita is associated with Mitsubishi Chemical Corporation, where he continues to develop and refine his inventions. His work at this prominent company has allowed him to collaborate with other talented professionals in the industry.
Collaborations
Some of his notable coworkers include Etsuko Hino and Takaaki Niinomi. Their collaborative efforts contribute to the innovative environment at Mitsubishi Chemical Corporation.
Conclusion
Jun Fujita's contributions to radiation sensitive compositions highlight his role as a key inventor in the field. His patent and ongoing work at Mitsubishi Chemical Corporation demonstrate his commitment to innovation and excellence.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile